On double-layer and reverse discharge creation during long positive voltage pulses in a bipolar HiPIMS discharge

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F24%3A43971960" target="_blank" >RIV/49777513:23520/24:43971960 - isvavai.cz</a>

Result on the web

<a href="https://doi.org/10.1088/1361-6595/ad3e29" target="_blank" >https://doi.org/10.1088/1361-6595/ad3e29</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1088/1361-6595/ad3e29" target="_blank" >10.1088/1361-6595/ad3e29</a>

Result language

angličtina

Original language name

On double-layer and reverse discharge creation during long positive voltage pulses in a bipolar HiPIMS discharge

Original language description

Time-resolved Langmuir probe diagnostics at the discharge centerline and at three distances from the target (35 mm, 60 mm, and 100 mm) was carried out during long positive voltage pulses (a duration of 500 µs and a preset positive voltage of 100 V) in bipolar High-Power Impulse Magnetron Sputtering of a Ti target (a diameter of 100 mm) using an unbalanced magnetron. Fast-camera spectroscopy imaging recorded light emission from Ar and Ti atoms and singly charged ions during positive voltage pulses. It was found that during the long positive voltage pulse, the floating and the plasma potentials suddenly decrease, which is accompanied by the presence of anode light located on the discharge centerline between the target center and the magnetic null of the magnetron&apos;s magnetic field. These light patterns are related to the ignition of a reverse discharge, which leads to the subsequent rise in the plasma and the floating potentials. The reversed discharge is burning up to the end of the positive voltage pulse, but the plasma and floating potentials have lower values than the values from the initial part of the positive voltage pulse. Secondary electron emission induced by the impinging Ar+ ions to the grounded surfaces in the vicinity of the discharge plasma together with the mirror configuration of the magnetron magnetic field are identified as the probable causes of the charge double-layer structure formation in front of the target and the ignition of the reverse discharge.

Czech name

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Czech description

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Type

J_imp - Article in a specialist periodical, which is included in the Web of Science database

CEP classification

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OECD FORD branch

10305 - Fluids and plasma physics (including surface physics)

Project

<a href="/en/project/EH22_008%2F0004572" target="_blank" >EH22_008/0004572: Quantum materials for applications in sustainable technologies</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year

2024

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Plasma Sources Science and Technology

ISSN

0963-0252

e-ISSN

1361-6595

Volume of the periodical

33

Issue of the periodical within the volume

5

Country of publishing house

GB - UNITED KINGDOM

Number of pages

14

Pages from-to

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UT code for WoS article

001220303700001

EID of the result in the Scopus database

2-s2.0-85193212836