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Direct current and high power impulse magnetron sputtering discharges with a positively biased anode

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F21%3A00552303" target="_blank" >RIV/68378271:_____/21:00552303 - isvavai.cz</a>

  • Result on the web

    <a href="http://hdl.handle.net/11104/0327435" target="_blank" >http://hdl.handle.net/11104/0327435</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1116/6.0001054" target="_blank" >10.1116/6.0001054</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Direct current and high power impulse magnetron sputtering discharges with a positively biased anode

  • Original language description

    A magnetron sputtering discharge with a positively biased anode in argon gas is investigated by Langmuir probe diagnostics and by energy-resolved mass spectrometry. The discharge is operated in continuous (direct current) and in pulsed (high power impulse magnetron sputtering, Hi) mode with a Ti target and in Ar gas. Singly-charged Ar.+., Ti.+., and Ar.2..+. and doubly-charged Ar.2+. and Ti.2+. ions are observed. A novel approach is to bias the magnetron anode. Application of a positive anode voltage shifts the kinetic energies of plasma ions by qe.0.V.a., where V.a. is the anode voltage and qe.0. is the ion charge. It allows for an effective control of plasma ion energies.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database

  • CEP classification

  • OECD FORD branch

    10305 - Fluids and plasma physics (including surface physics)

Result continuities

  • Project

    Result was created during the realization of more than one project. More information in the Projects tab.

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Others

  • Publication year

    2021

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Journal of Vacuum Science & Technology A : Vacuum, Surfaces and Films

  • ISSN

    0734-2101

  • e-ISSN

    1520-8559

  • Volume of the periodical

    39

  • Issue of the periodical within the volume

    4

  • Country of publishing house

    US - UNITED STATES

  • Number of pages

    15

  • Pages from-to

    043007

  • UT code for WoS article

    000665103800001

  • EID of the result in the Scopus database

    2-s2.0-85108705144