Energy distribution of negatively and positively charged ions in a magnetron sputtering discharge with a tungsten cathode and a positively biased anode in an argon/oxygen gas mixture
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F24%3A00601376" target="_blank" >RIV/68378271:_____/24:00601376 - isvavai.cz</a>
Result on the web
<a href="https://hdl.handle.net/11104/0358543" target="_blank" >https://hdl.handle.net/11104/0358543</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1088/1361-6595/ad8dfa" target="_blank" >10.1088/1361-6595/ad8dfa</a>
Alternative languages
Result language
angličtina
Original language name
Energy distribution of negatively and positively charged ions in a magnetron sputtering discharge with a tungsten cathode and a positively biased anode in an argon/oxygen gas mixture
Original language description
The energy distribution of negatively and positively charged ions in a magnetron discharge with a positively biased anode is investigated. A tungsten cathode operated in an argon/oxygen gas mixture is employed. The magnetron is operated either in direct current magnetron sputtering or in high power impulse magnetron sputtering mode. Positively charged atomic O+, Ar+, and W+ ions, molecular O+2 , ArO+, Ar+2 , WO+, WO+2 , and WO+3 , and doubly charged Ar2+, W2+ and WO2+ ions are observed. Negatively charged O−, O− 2 , W−, WO−, WO− 2 , and WO− 3 ions form inside the plasma volume by electron attachment reactions. In addition, a small part of the negatively charged ions is sputtered directly from the negatively biased cathode and observed at high kinetic energies corresponding to the cathode potential.n
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10305 - Fluids and plasma physics (including surface physics)
Result continuities
Project
<a href="/en/project/EH22_008%2F0004596" target="_blank" >EH22_008/0004596: Sensors and Detectors for Future Information Society</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2024
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Plasma Sources Science & Technology
ISSN
0963-0252
e-ISSN
1361-6595
Volume of the periodical
33
Issue of the periodical within the volume
11
Country of publishing house
US - UNITED STATES
Number of pages
12
Pages from-to
115006
UT code for WoS article
001353747600001
EID of the result in the Scopus database
2-s2.0-85209874878