Reverse discharge in bipolar HiPIMS and its dependence on magnetic field geometry

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F24%3A43972626" target="_blank" >RIV/49777513:23520/24:43972626 - isvavai.cz</a>
Result on the web
—
DOI - Digital Object Identifier
—

Result language
angličtina
Original language name
Reverse discharge in bipolar HiPIMS and its dependence on magnetic field geometry
Original language description
Bipolar high-power impulse magnetron sputtering (BP-HiPIMS) includes a positive voltage pulse (PP) after a negative voltage pulse (NP) to enhance film deposition. The positive pulse propels ions towards the substrate, increasing deposition rate and film hardness. Sometimes, a reverse discharge (RD) occurs during the PP, indicated by a reduction in plasma and floating potentials. RD is caused by secondary electrons from Ar+ ions and the magnetron's magnetic field configuration. RD can degrade the quality of the deposited film. The study focuses on how the magnetic field geometry affects RD during PP. Experiments were conducted with a titanium target and varied magnetic field configurations. Results showed that the delay between PP and RD decreases with a weaker outer magnetic field. A weaker inner magnetic field delays RD ignition, and in some cases, prevents it entirely. Optimizing magnetic field geometry can control RD formation during BP-HiPIMS.
Czech name
—
Czech description
—

Publication year
2024
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Similar results(10)