A reverse discharge during positive voltage pulses in bipolar high-power impulse magnetron sputtering
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F24%3A43973141" target="_blank" >RIV/49777513:23520/24:43973141 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
A reverse discharge during positive voltage pulses in bipolar high-power impulse magnetron sputtering
Original language description
Bipolar high-power impulse magnetron sputtering (BP-HiPIMS) is characterized by applying a positive voltage pulse (PP) after a sputtering negative pulse (NP). This PP accelerates ions toward the substrate, enhancing deposition rate and film quality. However, the ignition of a reverse discharge (RD) during the PP can degrade the deposited films. Experiments showed that the delay between PP initiation and RD formation increases with a weaker inner magnetic field, while the effect is opposite for the outer magnetic field. The recorded anode light patterns confirmed the RD presence, emphasizing the importance of magnetic field geometry in controlling RD behavior during PP.
Czech name
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Czech description
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Classification
Type
O - Miscellaneous
CEP classification
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OECD FORD branch
10305 - Fluids and plasma physics (including surface physics)
Result continuities
Project
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Continuities
S - Specificky vyzkum na vysokych skolach
Others
Publication year
2024
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů