ZnO:Al films prepared by rf magnetron sputtering applied as back reflectors in thin-film silicon solar cells
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23640%2F08%3A00501212" target="_blank" >RIV/49777513:23640/08:00501212 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
ZnO:Al films prepared by rf magnetron sputtering applied as back reflectors in thin-film silicon solar cells
Original language description
The substrate temperature significantly affects the crystallite size, the effect of the rf. power and pressure on the crystallite size is less pronounced. The largest crystallite size of 300 nm was determined in films deposited in the range of 75 °C to 100 °C. The increasing substrate temperature enhances the doping efficiency resulting in films with a lower resistivity and wider optical gap. The use of the optimal sputtering conditions (75 oC to 100 oC, 1 ?bar and 800 W) for depositing ZnO:Al back reflector in a-Si:H solar cells resulted in an S-shaped J-V curve and a low fill factor. By using an increased pressure of 25 ?bar during sputtering of the ZnO:Al a relative increase of 10 % in the efficiency was achieved in comparison to the cell without the ZnO:Al. The improvement resulted mainly from an enhancement of ~ 1.3 mA/cm2 in the short circuit current.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
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Result continuities
Project
<a href="/en/project/1M06031" target="_blank" >1M06031: Materials and components for environment protection</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2008
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Thin Solid Films
ISSN
0040-6090
e-ISSN
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Volume of the periodical
516
Issue of the periodical within the volume
21
Country of publishing house
NL - THE KINGDOM OF THE NETHERLANDS
Number of pages
7
Pages from-to
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UT code for WoS article
000259727900096
EID of the result in the Scopus database
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