Surface morphology and crystalline structure of sequentially sputtered ZnO nanocoatings

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23640%2F14%3A43922858" target="_blank" >RIV/49777513:23640/14:43922858 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1016/j.apsusc.2014.05.121" target="_blank" >http://dx.doi.org/10.1016/j.apsusc.2014.05.121</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.apsusc.2014.05.121" target="_blank" >10.1016/j.apsusc.2014.05.121</a>

Result language
angličtina
Original language name
Surface morphology and crystalline structure of sequentially sputtered ZnO nanocoatings
Original language description
The sequential sputtering technology was developed for the formation of transparent and conductive ZnO ultrathin ?lms (doped by Al, Ga) of thicknesses about 100 nm. When comparing continuous and sequential deposition modes, the latter increased the preferential [001] columnar texture of ZnO:(Ga, Al) ?lms, lowered their grain and crystallite sizes (25 nm/40 nm and 33 nm/47 nm), lattice stress gradients (0.147 GPa nm?1 /0.180 GPa nm?1) and microstrains (8.4x10?3 /5.6x10?3 ), rose their transmittance in Vis/NIR region (above 80%) and decreased their refractive index (values below 2).
Czech name
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Czech description
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Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
JJ - Other materials
OECD FORD branch
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Project
<a href="/en/project/ED2.1.00%2F03.0088" target="_blank" >ED2.1.00/03.0088: Centre of the New Technologies and Materials</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2014
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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