Thickness dependent wetting properties and surface free energy of HfO2 thin films
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23640%2F16%3A43928833" target="_blank" >RIV/49777513:23640/16:43928833 - isvavai.cz</a>
Alternative codes found
RIV/49777513:23520/16:43928833
Result on the web
<a href="http://dx.doi.org/10.1063/1.4953262" target="_blank" >http://dx.doi.org/10.1063/1.4953262</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1063/1.4953262" target="_blank" >10.1063/1.4953262</a>
Alternative languages
Result language
angličtina
Original language name
Thickness dependent wetting properties and surface free energy of HfO2 thin films
Original language description
We show here that intrinsic hydrophobicity of HfO2 thin films can be easily tuned by the variation of film thickness. We used the reactive high-power impulse magnetron sputtering for preparation of high-quality HfO2 films with smooth topography and well-controlled thickness. Results show a strong dependence of wetting properties on the thickness of the film in the range of 50-250 nm due to the dominance of the electrostatic Lifshitz-van der Waals component of the surface free energy. We have found the water droplet contact angle ranging from ALMOST EQUAL TO120o for the thickness of 50 nm to 100o for the thickness of 2300 nm. At the same time the surface free energy grows from ALMOST EQUAL TO25 mJ/m^2 for the thickness of 50 nm to ALMOST EQUAL TO33 mJ/m^2 for the thickness of 2300 nm. We propose two explanations for the observed thickness dependence of the wetting properties: influence of the non-dominant texture and/or non-monotonic size dependence of the particle surface energy.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
JJ - Other materials
OECD FORD branch
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Result continuities
Project
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Continuities
S - Specificky vyzkum na vysokych skolach
Others
Publication year
2016
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
APPLIED PHYSICS LETTERS
ISSN
0003-6951
e-ISSN
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Volume of the periodical
108
Issue of the periodical within the volume
23
Country of publishing house
US - UNITED STATES
Number of pages
5
Pages from-to
'231602-1'-'231602-5'
UT code for WoS article
000378924700010
EID of the result in the Scopus database
2-s2.0-84974529225