Design of magnetic field configuration for controlled discharge properties in highly ionized plasma

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60076658%3A12310%2F15%3A43888690" target="_blank" >RIV/60076658:12310/15:43888690 - isvavai.cz</a>

Alternative codes found

RIV/68378271:_____/15:00510804

Result on the web

<a href="http://dx.doi.org/10.1088/0963-0252/24/4/045016" target="_blank" >http://dx.doi.org/10.1088/0963-0252/24/4/045016</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1088/0963-0252/24/4/045016" target="_blank" >10.1088/0963-0252/24/4/045016</a>

Result language

angličtina

Original language name

Design of magnetic field configuration for controlled discharge properties in highly ionized plasma

Original language description

In the present article, the effect of magnetic field design on electron and ion properties in both a metallic Ti/Ar and a reactive Ti/Ar + O-2 high power impulse magnetron sputtering (HiPIMS) discharges is investigated. For the purpose, a variable magnetron with defined imbalance and geometrical coefficients K and KG, respectively, was utilized. The electron density, the mean electron energy, the plasma potential, and the floating potential were determined by employing time-resolved Langmuir probe measurements, for four specified magnetic field configurations. Mass spectroscopy was used in order to determine the energy distribution function of metal (Ti+, Ti2+) and gaseous (Ar+, Ar2+, O+, O-2(+)) ions. Analysis of the measured data shows that the magnetic field design dramatically affects the charged particles energy- and spatial-distribution, causing a change in the plasma properties. It is concluded that a well-determined configuration of the magnetic field is necessary in order to i

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BL - Plasma physics and discharge through gases

OECD FORD branch

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Project

<a href="/en/project/GAP108%2F12%2F2104" target="_blank" >GAP108/12/2104: Advanced semiconductor materials for photoelectrochemical water splitting</a><br>

Continuities

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year

2015

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Plasma Sources Science and Technology

ISSN

0963-0252

e-ISSN

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Volume of the periodical

24

Issue of the periodical within the volume

4

Country of publishing house

GB - UNITED KINGDOM

Number of pages

10

Pages from-to

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UT code for WoS article

000364098900028

EID of the result in the Scopus database

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