Enhanced oxidation of TiO2 films prepared by high power impulse magnetron sputtering running in metallic mode

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60076658%3A12310%2F17%3A43895393" target="_blank" >RIV/60076658:12310/17:43895393 - isvavai.cz</a>

Alternative codes found

RIV/68378271:_____/17:00486984

Result on the web

<a href="http://aip.scitation.org/doi/10.1063/1.4977825" target="_blank" >http://aip.scitation.org/doi/10.1063/1.4977825</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1063/1.4977825" target="_blank" >10.1063/1.4977825</a>

Result language

angličtina

Original language name

Enhanced oxidation of TiO2 films prepared by high power impulse magnetron sputtering running in metallic mode

Original language description

A method is introduced that allows suppressing unwanted effects of target poisoning during reactive high-power impulse magnetron sputtering (R-HiPIMS) employed for deposition of oxide films. The method, based on higher reactivity of excited/activated oxygen species, is studied and demonstrated on TiO2 films deposited in R-HiPIMS discharge running very close to the metallic mode with a high deposition rate. An external source of energetic plasma that activates oxygen gas, delivered to the vicinity of the substrate, is combined with conventional R-HiPIMS of the Ti target. The activated oxygen species enable reducing the total flow rate, which simultaneously results in suppression of the target poisoning effect. On the other hand, sufficient oxidation and growth of transparent crystalline TiO2 films were observed. Published by AIP Publishing.

Czech name

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Czech description

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Type

J_imp - Article in a specialist periodical, which is included in the Web of Science database

CEP classification

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OECD FORD branch

10305 - Fluids and plasma physics (including surface physics)

Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2017

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Journal of Applied Physics

ISSN

0021-8979

e-ISSN

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Volume of the periodical

121

Issue of the periodical within the volume

17

Country of publishing house

US - UNITED STATES

Number of pages

9

Pages from-to

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UT code for WoS article

000400623700016

EID of the result in the Scopus database

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