Investigation of RF and DC plasma - jet system during deposition of highly oriented ZnO Films

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60076658%3A12410%2F03%3A00004555" target="_blank" >RIV/60076658:12410/03:00004555 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Investigation of RF and DC plasma - jet system during deposition of highly oriented ZnO Films

Original language description

RF and DC plasma jet sputtering systems were investigated as a source for deposition of ZnO thin films. Deposited ZnO films have a strong orientation of hexagonal crystallities with 'c' axis perpendicular to the substrate surface. Temperature of the substrate did not exceed 150oC during the deposition. Langmuir probe measurement performed at the substrate revealed two group of electrons with approximate maxwellian distribution in the DC plasma jet and one maxwellian group in the case of RF plasma jet system. Electron concentration in the RF jet was about 5 109 - 1010 cm-3 with electron temperature 2.5 -3.5 eV. Concentration of cold electrons in the DC jet was usually 109 cm-3 with temperature 0.5 eV and hot electrons 108 cm-3 with temperature 2-3.5 eV.Photography also confirmed that plasma density is higher in the position of the substrate in the RF jet than in the DC jet. Other obtained macroscopic parameters as plasma potential, floating potential and DC voltage of the Zn nozzle rel

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BL - Plasma physics and discharge through gases

OECD FORD branch

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Project

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Continuities

Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2003

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

In: Surface and Coatings Technology

ISSN

0257-8972

e-ISSN

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Volume of the periodical

2003

Issue of the periodical within the volume

174-175

Country of publishing house

NL - THE KINGDOM OF THE NETHERLANDS

Number of pages

5

Pages from-to

627-631

UT code for WoS article

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EID of the result in the Scopus database

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