Limited volume thin film deposition on geometrically complicated substrates

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60076658%3A12410%2F09%3A00011372" target="_blank" >RIV/60076658:12410/09:00011372 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Limited volume thin film deposition on geometrically complicated substrates

Original language description

This paper is focused on both the theoretical and experimental study of active particle penetration into a closed slot. Presented in this paper are layer profiles obtained through the plasma polymerization of acetylene on a specially developed substrateand the TiOx based layer profiles obtained by plasma enhanced chemical vapour deposition (PECVD) on a glass substrate. In the second part of the paper a computational fluid model is presented that was developed in order to gain insight into the overriding physical phenomena taking part during the deposition process. This model enables us to predict the layer profile on complicated three-dimensional substrates and to set up the optimal parameters during the layer deposition. The data obtained theoretically and experimentally are compared.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BL - Plasma physics and discharge through gases

OECD FORD branch

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Project

<a href="/en/project/KAN101120701" target="_blank" >KAN101120701: Nanocomposite films and nanoparticles prepared in low pressure plasma for surface modifications</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2009

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

European Physical Journal D

ISSN

1434-6060

e-ISSN

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Volume of the periodical

54

Issue of the periodical within the volume

2

Country of publishing house

US - UNITED STATES

Number of pages

5

Pages from-to

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UT code for WoS article

000268329200007

EID of the result in the Scopus database

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