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TiOx surface properties in dependency on Glancing Angle Deposition parametres

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60076658%3A12410%2F11%3A43883191" target="_blank" >RIV/60076658:12410/11:43883191 - isvavai.cz</a>

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    TiOx surface properties in dependency on Glancing Angle Deposition parametres

  • Original language description

    The aim of this paper is to show the importance of Glancing Angle Deposition parameters on morphology and surface properties thin TiOx films. Special interest was focused on the roughness investigated layers. Thin films were deposited by DC unbalanced magnetron sputtering at low temperature. Four types of architecture were achieved by Glancing Angle Deposition Methods. Those layers were diagnosed by AFM and SEM. TiNxOy films were investigated besides the TiOx layers. All the films were deposited for twotyped of GLAD, namely for Reactive Gas Constant Flow (RGCF) and Reactive Gas Pulsing Proccess (RGPP) during the deposition. The influence of deposition method is investigated in focus on surface properties.

  • Czech name

  • Czech description

Classification

  • Type

    O - Miscellaneous

  • CEP classification

    BL - Plasma physics and discharge through gases

  • OECD FORD branch

Result continuities

  • Project

    <a href="/en/project/KAN101120701" target="_blank" >KAN101120701: Nanocomposite films and nanoparticles prepared in low pressure plasma for surface modifications</a><br>

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Others

  • Publication year

    2011

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů