TiOx surface properties in dependency on Glancing Angle Deposition parametres
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60076658%3A12410%2F11%3A43883191" target="_blank" >RIV/60076658:12410/11:43883191 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
TiOx surface properties in dependency on Glancing Angle Deposition parametres
Original language description
The aim of this paper is to show the importance of Glancing Angle Deposition parameters on morphology and surface properties thin TiOx films. Special interest was focused on the roughness investigated layers. Thin films were deposited by DC unbalanced magnetron sputtering at low temperature. Four types of architecture were achieved by Glancing Angle Deposition Methods. Those layers were diagnosed by AFM and SEM. TiNxOy films were investigated besides the TiOx layers. All the films were deposited for twotyped of GLAD, namely for Reactive Gas Constant Flow (RGCF) and Reactive Gas Pulsing Proccess (RGPP) during the deposition. The influence of deposition method is investigated in focus on surface properties.
Czech name
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Czech description
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Classification
Type
O - Miscellaneous
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
<a href="/en/project/KAN101120701" target="_blank" >KAN101120701: Nanocomposite films and nanoparticles prepared in low pressure plasma for surface modifications</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2011
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů