Sputter Deposition of Nanostructured TiO2 Thin Films

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21220%2F14%3A00223787" target="_blank" >RIV/68407700:21220/14:00223787 - isvavai.cz</a>
Alternative codes found
RIV/60076658:12410/14:43887118
Result on the web
<a href="http://dx.doi.org/10.1109/TPS.2014.2326896" target="_blank" >http://dx.doi.org/10.1109/TPS.2014.2326896</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1109/TPS.2014.2326896" target="_blank" >10.1109/TPS.2014.2326896</a>

Result language
angličtina
Original language name
Sputter Deposition of Nanostructured TiO2 Thin Films
Original language description
A physical vapor deposition (PVD) method using plasma discharge-glancing angle deposition (GLAD), based on a variation of the particle's incidence angle to the substrate, enables the formation of TiO2 thin films with oriented columnar nanostructure. Theincidence angle influences crystalline, nanostructure, and surface properties of the deposited films. Images illustrating the GLAD PVD method and scanning electron microscopy images of the TiO2 thin films deposited with different incidence angles alpha are presented.
Czech name
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Czech description
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Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2014
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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