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Effect of argon ion sputter etching on the surface chemistry and surface properties of binary Ti-Nb alloys and commercially pure titanium

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60076658%3A90238%2F25%3AN0000002" target="_blank" >RIV/60076658:90238/25:N0000002 - isvavai.cz</a>

  • Result on the web

    <a href="https://www.sciencedirect.com/science/article/pii/S2468023025025702" target="_blank" >https://www.sciencedirect.com/science/article/pii/S2468023025025702</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1016/j.surfin.2025.108317" target="_blank" >10.1016/j.surfin.2025.108317</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Effect of argon ion sputter etching on the surface chemistry and surface properties of binary Ti-Nb alloys and commercially pure titanium

  • Original language description

    The effect of argon ion sputter etching (Ar+) on Ti-Nb alloys with different niobium concentrations (Ti25Nb, Ti39Nb, and Ti55Nb) and distinct microstructures was investigated, using commercially pure titanium (CPTi) as a reference. The characterization included surface topography, surface morphology, chemistry, wettability, residual stress, and hardness to clarify the role of this process in the treatment of titanium materials for biomedical applications. Sputtering yields were additionally evaluated by Monte Carlo SDTrimSP simulations to complement the experiments. Etching exposed grain boundaries and generated intergranular height differences, with greater orientation diversity leading to increased surface roughness. The surface enrichment of niobium oxides after ion sputter etching rose with alloy niobium concentration and accordingly enhanced wettability. All Ti-Nb alloys exhibited a transition from hydrophobic to hydrophilic behavior. Moreover, ion sputter etching reduced residual stress, reflected by a decrease in surface hardness. Overall, the findings show that ion sputter etching, inherent to many PVD methods, has a decisive influence on the surface properties of Ti-Nb alloys and should be considered when designing surface treatments.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database

  • CEP classification

  • OECD FORD branch

    10401 - Organic chemistry

Result continuities

  • Project

  • Continuities

Others

  • Publication year

    2025

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    SURFACES AND INTERFACES

  • ISSN

    2468-0230

  • e-ISSN

  • Volume of the periodical

    Volume 80

  • Issue of the periodical within the volume

    80

  • Country of publishing house

    NL - THE KINGDOM OF THE NETHERLANDS

  • Number of pages

    13

  • Pages from-to

    n/a - n/a

  • UT code for WoS article

    001643934600001

  • EID of the result in the Scopus database