MAGNETRON SPUTTERING FABRICATION OF ERBIUM DOPED GALLIUM NITRIDE THIN FILMS
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60461373%3A22310%2F04%3A00011659" target="_blank" >RIV/60461373:22310/04:00011659 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
MAGNETRON SPUTTERING FABRICATION OF ERBIUM DOPED GALLIUM NITRIDE THIN FILMS
Original language description
MAGNETRON SPUTTERING FABRICATION OF ERBIUM DOPED GALLIUM NITRIDE THIN FILMS
Czech name
Magnetronové naprašování erbiem dotovaných tenkých vrstev GaN
Czech description
Magnetronové naprašování erbiem dotovaných tenkých vrstev GaN
Classification
Type
D - Article in proceedings
CEP classification
JA - Electronics and optoelectronics
OECD FORD branch
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Result continuities
Project
<a href="/en/project/GA104%2F03%2F0385" target="_blank" >GA104/03/0385: New technology of optical thin layers based on carbon and organic materials for active structure of integrated optics</a><br>
Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2004
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
Book of abstract 10th Joint Vacuum Konference
ISBN
961-90025-5-5
ISSN
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e-ISSN
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Number of pages
1
Pages from-to
78
Publisher name
Družstvo za vakuumstvo tehniko Slovenije
Place of publication
Ljubljana
Event location
Portoroz, Slovenia
Event date
Sep 28, 2004
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
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