Electrochemical etching of copper foils for graphene preparation by CVD

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60461373%3A22310%2F18%3A43917093" target="_blank" >RIV/60461373:22310/18:43917093 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1109/ASDAM.2018.8544469" target="_blank" >http://dx.doi.org/10.1109/ASDAM.2018.8544469</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1109/ASDAM.2018.8544469" target="_blank" >10.1109/ASDAM.2018.8544469</a>

Result language
angličtina
Original language name
Electrochemical etching of copper foils for graphene preparation by CVD
Original language description
The contribution is focused to modification of Cu foils prior to graphene growth by the method of chemical vapour deposition, with the aim to prepare higher quality graphene. The Cu foils are chemically polished prior to the process in various chemical solutions. Influence of these modifications has principal meaning to graphene growth; single-layer graphene has been prepared.
Czech name
—
Czech description
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Project
<a href="/en/project/GA17-00607S" target="_blank" >GA17-00607S: Complex Artificial Electromagnetic Structures and Nanostructures</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2018
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
Proceedings: 12th International Conference on Advanced Semiconductor Devices and Microsystems
ISBN
978-1-5386-7488-8
ISSN
—
e-ISSN
neuvedeno
Number of pages
4
Pages from-to
69-72
Publisher name
IEEE Institute of Electrical and Electronics Engineers
Place of publication
Piscataway, New Jersey
Event location
Smolenice
Event date
Oct 21, 2018
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
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