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Production of Ultrathin and High-Quality Nanosheet Networks via Layer-by-Layer Assembly at Liquid-Liquid Interfaces

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60461373%3A22310%2F24%3A43931483" target="_blank" >RIV/60461373:22310/24:43931483 - isvavai.cz</a>

  • Result on the web

    <a href="https://pubs.acs.org/doi/full/10.1021/acsnano.4c09745" target="_blank" >https://pubs.acs.org/doi/full/10.1021/acsnano.4c09745</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1021/acsnano.4c09745" target="_blank" >10.1021/acsnano.4c09745</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Production of Ultrathin and High-Quality Nanosheet Networks via Layer-by-Layer Assembly at Liquid-Liquid Interfaces

  • Original language description

    Solution-processable 2D materials are promising candidates for a range of printed electronics applications. Yet maximizing their potential requires solution-phase processing of nanosheets into high-quality networks with carrier mobility (mu(Net)) as close as possible to that of individual nanosheets (mu(NS)). In practice, the presence of internanosheet junctions generally limits electronic conduction, such that the ratio of junction resistance (R-J) to nanosheet resistance (R-NS), determines the network mobility via mu(NS)/mu(Net) approximate to R-J/R-NS + 1. Hence, achieving R-J/R-NS &lt; 1 is a crucial step for implementation of 2D materials in printed electronics applications. In this work, we utilize an advanced liquid-interface deposition process to maximize nanosheet alignment and network uniformity, thus reducing R-J. We demonstrate the approach using graphene and MoS2 as model materials, achieving low RJ/RNS values of 0.5 and 0.2, respectively. The resultant graphene networks show a high conductivity of sigma(Net) = 5 x 10(4) S/m while our semiconducting MoS2 networks demonstrate record mobility of mu(Net) = 30 cm(2)/(V s), both at extremely low network thickness (t(Net) &lt; 10 nm). Finally, we show that the deposition process is compatible with nonlayered quasi-2D materials such as silver nanosheets (AgNS), achieving network conductivity close to bulk silver for networks &lt;100 nm-thick.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database

  • CEP classification

  • OECD FORD branch

    10402 - Inorganic and nuclear chemistry

Result continuities

  • Project

    Result was created during the realization of more than one project. More information in the Projects tab.

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Others

  • Publication year

    2024

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    ACS Nano

  • ISSN

    1936-0851

  • e-ISSN

    1936-086X

  • Volume of the periodical

    18

  • Issue of the periodical within the volume

    47

  • Country of publishing house

    US - UNITED STATES

  • Number of pages

    13

  • Pages from-to

    32589-32601

  • UT code for WoS article

    001376459300001

  • EID of the result in the Scopus database

    2-s2.0-85211392958