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Performance improvement of MoS2/graphene heterostructures based FET by tuning mobility and threshold voltage using APTES

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60461373%3A22310%2F25%3A43930191" target="_blank" >RIV/60461373:22310/25:43930191 - isvavai.cz</a>

  • Result on the web

    <a href="https://www.sciencedirect.com/science/article/pii/S0921510724006263#fr3323" target="_blank" >https://www.sciencedirect.com/science/article/pii/S0921510724006263#fr3323</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1016/j.mseb.2024.117797" target="_blank" >10.1016/j.mseb.2024.117797</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Performance improvement of MoS2/graphene heterostructures based FET by tuning mobility and threshold voltage using APTES

  • Original language description

    2D materials have been intensively explored because of their remarkable electrical properties, with a special focus devoted to the fabrication of lateral heterostructures. Two-dimensional materials like molybdenum disulphide (MoS2) have been shown to make field effect transistors (FETs) with high current on–off ratios. However, carrier mobility in back gate MoS2 FETs is often low (0.5–20 cm2/Vs), which limits the overall device performance. Here, we report a novel low Schottky barrier transistor based on graphene, MoS2 and Self-assembled monolayer (SAMS) that utilizes vertical heterostructures in which the channel is composed of MoS2/graphene vertical heterostructures that uses graphene as the electrodes. Self-assembled monolayers of Aminopropyltriethoxysilane (APTES) serve a dual purpose, used for passivation and as an n-type dopant for MoS2, significantly improving the electrical properties. Our experimental and theoretical results show that, with the deposition of APTES on the substrate, there is an increase in mobility from 103 to 135 cm2/Vs, along with the reduction in the threshold voltage from 5.04 to 1.05 V, which is attributed to APTES passivation, which prevents electron trapping and de-trapping, a significant factor determining variation in threshold voltage (ΔVTH). Density functional theory (DFT) calculations support the experimental results and demonstrate that the introduction of APTES doping in MoS2 induces n-type doping in the material, hence improving the performance of the device. The combination of graphene electrodes along with the APTES passivation on substrate holds the promise for reliable and efficient synaptic applications in neuromorphic computing technologies, as well as next-generation complementary logic devices. © 2024 Elsevier B.V.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database

  • CEP classification

  • OECD FORD branch

    20501 - Materials engineering

Result continuities

  • Project

  • Continuities

    N - Vyzkumna aktivita podporovana z neverejnych zdroju

Others

  • Publication year

    2025

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Materials Science and Engineering B-Advanced Functional Solid-State Materials

  • ISSN

    0921-5107

  • e-ISSN

    1873-4944

  • Volume of the periodical

    311

  • Issue of the periodical within the volume

    117797

  • Country of publishing house

    NL - THE KINGDOM OF THE NETHERLANDS

  • Number of pages

    8

  • Pages from-to

    1-8

  • UT code for WoS article

    001355908600001

  • EID of the result in the Scopus database

    2-s2.0-85208456672