Physical and Gas Sensing Properties of NiO and TiO2 Films
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60461373%3A22340%2F02%3A00007030" target="_blank" >RIV/60461373:22340/02:00007030 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Physical and Gas Sensing Properties of NiO and TiO2 Films
Original language description
The NiO and TiO2 films were deposited by DC reactive magnetron sputtering from Ni and Ti targets on two types of substrates: Si and alumina. The microstructure and the composition of the films were analyzed using X-ray diffraction with Cu K alpha radiation in Bragg-Brentano geometry and grazing incident diffraction geometry. Surface topography of the films was examined by atomic force microscopy using a Topometrix Discover TM 2000 under normal air conditions. Films were tested in the presence of H2 andethylalcohol for their possible use in sensor applications.
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
JB - Sensors, detecting elements, measurement and regulation
OECD FORD branch
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Result continuities
Project
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Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2002
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
5th Scientific Conference on Electrical Engineering and Information Technology
ISBN
neuveden
ISSN
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e-ISSN
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Number of pages
3
Pages from-to
66-68
Publisher name
Slovak University of Technology
Place of publication
Bratislava
Event location
Bratislava
Event date
Sep 19, 2002
Type of event by nationality
EUR - Evropská akce
UT code for WoS article
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