Physical and Structural Characterization of NiO Films for Gas Detection
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60461373%3A22340%2F02%3A00007031" target="_blank" >RIV/60461373:22340/02:00007031 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Physical and Structural Characterization of NiO Films for Gas Detection
Original language description
Nickel oxide thin films, for use as function sensor layers for chemical sensors, have been deposited on Si and alumina substrates by DC magnetron sputtering. The influence of deposition parameters and annealing temperature on the structiral properties and surface roughness has been analyzed by X-ray diffraction and atomic force microscopy. The NiO thin films were tested in order to investigate their response to hydrogen in the concentrations up to 1.5 vol% and ethanol in the interval 0-1200 ppm at different operating temperatures.
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
JB - Sensors, detecting elements, measurement and regulation
OECD FORD branch
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Result continuities
Project
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Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2002
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
The Fourth International Conference on Advanced Semiconductor Devices and Microsystems ASDAM´02
ISBN
0-7803-7276-X
ISSN
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e-ISSN
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Number of pages
4
Pages from-to
107-110
Publisher name
Slovak University of Technology
Place of publication
Bratislava
Event location
Bratislava
Event date
Oct 14, 2002
Type of event by nationality
EUR - Evropská akce
UT code for WoS article
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