Dense TiO2 films grown by sol?gel dip coating on glass, F-doped SnO2, and silicon substrates
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61388955%3A_____%2F13%3A00384575" target="_blank" >RIV/61388955:_____/13:00384575 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1557/jmr.2012.240" target="_blank" >http://dx.doi.org/10.1557/jmr.2012.240</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1557/jmr.2012.240" target="_blank" >10.1557/jmr.2012.240</a>
Alternative languages
Result language
angličtina
Original language name
Dense TiO2 films grown by sol?gel dip coating on glass, F-doped SnO2, and silicon substrates
Original language description
Exceptionally dense titanium dioxide (TiO2) films were prepared via dip coating from a sol containing poly(hexafluorobutyl methacrylate) as the structure-directing agent. The films were grown on glass, F-doped SnO2, and crystalline silicon (111) faces, either pure or with a thin layer of SiO2. The TiO2 films cover perfectly even rough surfaces, which was ascribed to thixotropic properties of the precursor gel. The films provide antireflection function to crystalline Si wafers for photovoltaic applications. The optical reflectance in visible to near-infrared (NIR) wave lengths region is considerably smaller for Si wafers covered by TiO2/SiO2 film compared with that of SiO2/Si. The dense TiO2 films are amorphous with small amount of anatase and monoclinic TiO2(B). These two phases withstand calcination at 900 °C in films deposited on Si. For comparison, porous TiO2 films were grown by the same dip-coating protocol, but with alternative organic additives, either polymers or ionic liquids.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
CG - Electrochemistry
OECD FORD branch
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Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2013
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Journal of Materials Research
ISSN
0884-2914
e-ISSN
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Volume of the periodical
28
Issue of the periodical within the volume
3
Country of publishing house
US - UNITED STATES
Number of pages
9
Pages from-to
385-393
UT code for WoS article
000314421700015
EID of the result in the Scopus database
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