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Sol-gel preparation of silica and titania thin films

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61389021%3A_____%2F16%3A00469364" target="_blank" >RIV/61389021:_____/16:00469364 - isvavai.cz</a>

  • Result on the web

    <a href="http://dx.doi.org/10.1117/12.2257325" target="_blank" >http://dx.doi.org/10.1117/12.2257325</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1117/12.2257325" target="_blank" >10.1117/12.2257325</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Sol-gel preparation of silica and titania thin films

  • Original language description

    Thin films of silicon dioxide (SiO2) and titanium dioxide (TiO2) for application in precision optics prepared via the solgel route are being investigated in this paper. The sol-gel process presents a low cost approach, which is capable of tailoring thin films of various materials in optical grade quality. Both SiO2 and TiO2 are materials well known for their application in the field of anti-reflective and also highly reflective optical coatings. For precision optics purposes, thickness control and high quality of such coatings are of utmost importance. In this work, thin films were deposited on microscope glass slides substrates using the dip-coating technique from a solution based on alkoxide precursors of tetraethyl orthosilicate (TEOS) and titanium isopropoxide (TIP) for SiO2 and TiO2, respectively. As-deposited films were studied using spectroscopic ellipsometry to determine their thickness and refractive index. Using a semi-empirical equation, a relationship between the coating speed and the heat-treated film thickness was described for both SiO2 and TiO2 thin films. This allows us to control the final heat-treated thin film thickness by simply adjusting the coating speed. Furthermore, films’ surface was studied using the white-light interferometry. As-prepared films exhibited low surface roughness with the area roughness parameter Sq being on average of 0.799 nm and 0.33 nm for SiO2 and TiO2, respectively.

  • Czech name

  • Czech description

Classification

  • Type

    D - Article in proceedings

  • CEP classification

    JH - Ceramics, fire-proof materials and glass

  • OECD FORD branch

Result continuities

  • Project

    <a href="/en/project/LO1206" target="_blank" >LO1206: Modern optical systems and technologies</a><br>

  • Continuities

    I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Others

  • Publication year

    2016

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Article name in the collection

    Proceedings of SPIE 10151, Optics and Measurement International Conference 2016

  • ISBN

    978-1-5106-0753-8

  • ISSN

    0277-786X

  • e-ISSN

  • Number of pages

    4

  • Pages from-to

  • Publisher name

    SPIE, Society of Photo-Optical Instrumentation Engineers

  • Place of publication

    Bellingham

  • Event location

    Liberec

  • Event date

    Oct 11, 2016

  • Type of event by nationality

    WRD - Celosvětová akce

  • UT code for WoS article

    000393154700046