Sol-gel preparation of silica and titania thin films
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61389021%3A_____%2F16%3A00469364" target="_blank" >RIV/61389021:_____/16:00469364 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1117/12.2257325" target="_blank" >http://dx.doi.org/10.1117/12.2257325</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1117/12.2257325" target="_blank" >10.1117/12.2257325</a>
Alternative languages
Result language
angličtina
Original language name
Sol-gel preparation of silica and titania thin films
Original language description
Thin films of silicon dioxide (SiO2) and titanium dioxide (TiO2) for application in precision optics prepared via the solgel route are being investigated in this paper. The sol-gel process presents a low cost approach, which is capable of tailoring thin films of various materials in optical grade quality. Both SiO2 and TiO2 are materials well known for their application in the field of anti-reflective and also highly reflective optical coatings. For precision optics purposes, thickness control and high quality of such coatings are of utmost importance. In this work, thin films were deposited on microscope glass slides substrates using the dip-coating technique from a solution based on alkoxide precursors of tetraethyl orthosilicate (TEOS) and titanium isopropoxide (TIP) for SiO2 and TiO2, respectively. As-deposited films were studied using spectroscopic ellipsometry to determine their thickness and refractive index. Using a semi-empirical equation, a relationship between the coating speed and the heat-treated film thickness was described for both SiO2 and TiO2 thin films. This allows us to control the final heat-treated thin film thickness by simply adjusting the coating speed. Furthermore, films’ surface was studied using the white-light interferometry. As-prepared films exhibited low surface roughness with the area roughness parameter Sq being on average of 0.799 nm and 0.33 nm for SiO2 and TiO2, respectively.
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
JH - Ceramics, fire-proof materials and glass
OECD FORD branch
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Result continuities
Project
<a href="/en/project/LO1206" target="_blank" >LO1206: Modern optical systems and technologies</a><br>
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2016
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
Proceedings of SPIE 10151, Optics and Measurement International Conference 2016
ISBN
978-1-5106-0753-8
ISSN
0277-786X
e-ISSN
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Number of pages
4
Pages from-to
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Publisher name
SPIE, Society of Photo-Optical Instrumentation Engineers
Place of publication
Bellingham
Event location
Liberec
Event date
Oct 11, 2016
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
000393154700046