Relief grating induced by photo-expansion in Ga-Ge-S and Ga-Ge-As-S glasses.

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61388980%3A_____%2F02%3A50023058" target="_blank" >RIV/61388980:_____/02:50023058 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Relief grating induced by photo-expansion in Ga-Ge-S and Ga-Ge-As-S glasses.

Original language description

We report the fabrication of relief diffraction gratings recorded on a surface of photosensitive Ga10Ge25S65 and Ga5Ge25As5S65 glasses by means of interference of two UV laser beams at 351 nm. The diffraction efficiency (eta) of first diffraction order was measured. Atomic-force-microscope (AFM) was used to perform a 3D imaging analysis of the sample surface topography that shows the superposition of an imprinted grating over the topography of the glass. The change in the absorption edge and the refractive index has been evaluated and a structural approach of the relief grating on the glass surface has been discussed.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

CA - Inorganic chemistry

OECD FORD branch

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Project

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Continuities

Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2002

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Journal of Optoelectronics and Advanced Materials

ISSN

1454-4164

e-ISSN

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Volume of the periodical

4

Issue of the periodical within the volume

2

Country of publishing house

BR - BRAZIL

Number of pages

6

Pages from-to

375-380

UT code for WoS article

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EID of the result in the Scopus database

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