The deposition of germanium nanoparticles on hydrogenated amorphous silicon.

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61388980%3A_____%2F17%3A00484339" target="_blank" >RIV/61388980:_____/17:00484339 - isvavai.cz</a>
Alternative codes found
RIV/68378271:_____/17:00478395 RIV/67985858:_____/17:00478395
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
The deposition of germanium nanoparticles on hydrogenated amorphous silicon.
Original language description
We reveal the mechanism of Ge nanoparticles (NPs) formation on the surface of the hydrogenated amorphous silicon (a-Si:H) deposited by Plasma Enhanced Chemical Vapor Deposition (PECVD) on ITO and a on boron doped nanocrystalline diamond (BDD). The coating of Ge NPs on a-Si:H was performed by molecular beam epitaxy (MBE) at temperatures up to 450 degrees C. The Ge NPs were characterized by Raman spectroscopy, scanning electron microscopy (SEM) and high resolution transmission electron microscopy (HRTEM). The nanocrystalline Ge particles are conglomerates of nanocrystals of size 10-15 nm and quantum dots (QDs) with size below 2 nm embedded in amorphous Ge phase. After coating with Ge NPs the a-Si:H thin films show better adhesion on BDD substrates then on ITO substrates.
Czech name
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Czech description
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Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year
2017
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
NANOCON 2016 8th International Conference on Nanomaterials - Research & Application. Conference proceedings
ISBN
978-80-87294-71-0
ISSN
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e-ISSN
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Number of pages
5
Pages from-to
133-137
Publisher name
TANGER Ltd.
Place of publication
Ostrava
Event location
Brno
Event date
Oct 19, 2016
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
000410656100022

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