Nickel oxide films by thermal annealing of ion-beam-sputtered Ni: Structure and electro-optical properties

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61389005%3A_____%2F17%3A00485884" target="_blank" >RIV/61389005:_____/17:00485884 - isvavai.cz</a>

Alternative codes found

RIV/68378271:_____/17:00485884 RIV/44555601:13440/17:43892965 RIV/00216208:11320/17:10364870

Result on the web

<a href="http://dx.doi.org/10.1016/j.tsf.2017.08.047" target="_blank" >http://dx.doi.org/10.1016/j.tsf.2017.08.047</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.tsf.2017.08.047" target="_blank" >10.1016/j.tsf.2017.08.047</a>

Result language

angličtina

Original language name

Nickel oxide films by thermal annealing of ion-beam-sputtered Ni: Structure and electro-optical properties

Original language description

Nickel oxide films were prepared by thermal annealing of Ni deposited by ion beam sputtering on Si (or glass) substrates. The annealing was carried out in a laboratory furnace open to air at temperatures 350 degrees C-500 degrees C with annealing time 1-7 h (1-h step). For as-deposited Ni films the sheet resistance R-S was found to be 8.39 Omega/square and no significant XRD diffraction peaks were observed. The thermal annealing resulted in significant changes in composition and electrical, structural and optical properties. The oxidation process led to a rapid growth of R-S up to 10(9)Omega/square, appearance of the optical absorption edge for oxidized Ni, and the formation of a polycrystalline NiO structure with the main NiO (111) diffraction peak. At 350 degrees C the annealing yielded 3-stage behavior of the sheet resistance due to limited oxidation during short time annealing. Longer processing times (>3 h) were necessary to successfully oxidize the deposited Ni film, after 1 h annealing the oxygen content (analyzed by nuclear resonance analysis) showed a significantly lower concentration within the depth of a sample, more uniform composition was found after prolonged annealing. XPS analysis showed the formation of a significant amount of nickel hydroxide at the surface. It was confirmed by ERDA. The optical properties were studied by Photothermal Deflection Spectroscopy (PDS). The data correlate with the 3-stage behavior of sheet resistance at 350 degrees C, suggesting lower oxidation during short-term annealing, while transparent nickel oxide films were formed during longer annealing and at higher temperatures. Based on analysis of the obtained experimental data (from measurement of the sheet resistance, XRD diffraction and optical absorption spectra), the temperature of 400 degrees C was found to be optimal for the formation of the fully oxidized NiO films.

Czech name

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Czech description

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Type

J_imp - Article in a specialist periodical, which is included in the Web of Science database

CEP classification

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OECD FORD branch

20506 - Coating and films

Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2017

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Thin Solid Films

ISSN

0040-6090

e-ISSN

—

Volume of the periodical

640

Issue of the periodical within the volume

10

Country of publishing house

CH - SWITZERLAND

Number of pages

8

Pages from-to

52-59

UT code for WoS article

000413804900009

EID of the result in the Scopus database

2-s2.0-85028805322