Comparison of PMMA shrinkage in ion beam lithography: PMMA on glass substrate vs free-standing PMMA film
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61389005%3A_____%2F23%3A00574018" target="_blank" >RIV/61389005:_____/23:00574018 - isvavai.cz</a>
Alternative codes found
RIV/67985882:_____/23:00574018 RIV/44555601:13440/23:43897659
Result on the web
<a href="https://doi.org/10.1016/j.nimb.2023.02.001" target="_blank" >https://doi.org/10.1016/j.nimb.2023.02.001</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.nimb.2023.02.001" target="_blank" >10.1016/j.nimb.2023.02.001</a>
Alternative languages
Result language
angličtina
Original language name
Comparison of PMMA shrinkage in ion beam lithography: PMMA on glass substrate vs free-standing PMMA film
Original language description
The present work focuses on the shrinkage of PMMA films under irradiation and its application to the creation of optical devices. We prepared the free-standing PMMA films in four different thicknesses (13, 21, 32, and 43 & mu,m), and PMMA films of the same thickness, but deposited on a glass substrate. A diffraction grating was chosen as the optical device to show the applicability of the method. The study revealed that at a film thickness of 13-32 & mu,m, the shrinkage of the free-standing film increases proportionally to its thickness, while the film on the substrate does not have a pronounced dependence. Films with the thickness of 43 & mu,m do not follow this trend. It was found that under the same irradiation conditions, the film on the substrate shrinks more compared to the free-standing film. Interference patterns from the created diffraction gratings were shown to present spurious illumination areas.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10304 - Nuclear physics
Result continuities
Project
<a href="/en/project/EF18_053%2F0017163" target="_blank" >EF18_053/0017163: Physicists on the move II</a><br>
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2023
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Nuclear Instruments & Methods in Physics Research Section B
ISSN
0168-583X
e-ISSN
1872-9584
Volume of the periodical
538
Issue of the periodical within the volume
MAY
Country of publishing house
NL - THE KINGDOM OF THE NETHERLANDS
Number of pages
8
Pages from-to
123-130
UT code for WoS article
001027901300001
EID of the result in the Scopus database
2-s2.0-85150335122