Optical response of channel waveguides in silicate glass created via ion implantation with optical barriers of varying thickness

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61389005%3A_____%2F25%3A00604956" target="_blank" >RIV/61389005:_____/25:00604956 - isvavai.cz</a>

Alternative codes found

RIV/44555601:13440/25:43899101 RIV/60461373:22310/25:43931405

Result on the web

<a href="https://www.sciencedirect.com/science/article/pii/S0030399224017912" target="_blank" >https://www.sciencedirect.com/science/article/pii/S0030399224017912</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.optlastec.2024.112333" target="_blank" >10.1016/j.optlastec.2024.112333</a>

Result language

angličtina

Original language name

Optical response of channel waveguides in silicate glass created via ion implantation with optical barriers of varying thickness

Original language description

Channel waveguides have been fabricated through ion implantation combined with photolithography in three types of silicate glass of diverse composition. The range of the implanted ions was different. Channel waveguide was formed by single- and multi-energy C+-ion implantation with different ion fluences, resulting in 1 x 1016 cm-2. The multi-energy implantation processes were performed at energies ranging from 0.8 to 1.6 MeV to establish a 1-mu m wide barrier for the optical signal, positioned approximately 2 mu m below the sample surface. For a precise methodology, Rutherford backscattering spectroscopy (RBS) was initially employed to ascertain the composition of the photoresist mask and, in conjunction with X-ray fluorescence (XRF) analysis, to determine the composition of the glass prior to ion implantation. Subsequently, the dimensions of the photoresist mask, glass compositions, and the derived glass-density values were utilised for SRIM simulations of the projected range of the C+ ion. This led to the creation of channel waveguides and, alternatively, the standard planar waveguides. The range depth of the implanted ions (2.6 mu m) and the waveguide-formation depth calculated (3.0 mu m) using mline spectroscopy were in good agreement. In the silicate glass with the highest Si content, the deepest range of carbon ions was SRIM-simulated, and optical modes (TE0 and TE1) were demonstrated at the wavelength of 473 nm. The increase in the refractive index corresponded to the value of 0.0168 for 473 nm. The effect of glass composition on the waveguide's fabrication was discussed. In addition, there was an evident difference between multi- and single-energy implantation processes. When an optical signal with the wavelength of 473 nm was introduced into the sample, only one mode was propagated for the single-energy implantation of C+ ions, whereas two modes were observed for the multi-energy implantation. The possibility of using multi-energy ion implantation for the controlled preparation of optical waveguides in glass has been demonstrated.

Czech name

—

Czech description

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Type

J_imp - Article in a specialist periodical, which is included in the Web of Science database

CEP classification

—

OECD FORD branch

10301 - Atomic, molecular and chemical physics (physics of atoms and molecules including collision, interaction with radiation, magnetic resonances, Mössbauer effect)

Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year

2025

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Optics and Laser Technology

ISSN

0030-3992

e-ISSN

1879-2545

Volume of the periodical

183

Issue of the periodical within the volume

May

Country of publishing house

GB - UNITED KINGDOM

Number of pages

12

Pages from-to

112333

UT code for WoS article

001392941700001

EID of the result in the Scopus database

2-s2.0-85212573009