Surface modification by EUV laser beam based on capillary discharge

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61389021%3A_____%2F11%3A00371236" target="_blank" >RIV/61389021:_____/11:00371236 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Surface modification by EUV laser beam based on capillary discharge
Original language description
Many applications require surface modification and micro-structuring of polymers. For these purposes is mainly used ultraviolet (UV) radiation from excimer lamps or excimer lasers. However, these sources have a decided disadvantage - degrading the polymer deep inside due to relatively big radiation penetration depth which may exceed 100 ?m. In contrast, extreme ultraviolet (EUV) radiation is absorbed in a layer approximately 100 nm thick only. In this work, the radiation from a discharge-plasma EUV source (with wavelength 46.9 nm) based on a capillary discharge driver is focused with a spherical Si/Sc multilayer mirror for surface modification of PMMA sample or thin gold layer (thickness about 40 nm). It was found that the focused EUV laser beam is capable by one shot to ablate PMMA or layer of gold, even if the focus is significantly influenced by astigmatism.
Czech name
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Czech description
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Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year
2011
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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