Discharge-pumped xuv source (Annual Gaseous Electronics Conference/69./.

Result code in IS VaVaI
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Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Discharge-pumped xuv source (Annual Gaseous Electronics Conference/69./.
Original language description
Předneseno na konferenci: APS Gaseous Electronics Conference 2016,Bochum, 10-14.10.2016, str. 55poster, Bulletin of the American Physical Society, vol.61,9/2016,nWe have built two experimental devices (CAPEX and CAPEX-U) as XUV sources, which are based on the fast capillary discharge. On both these devices we have observed lasing at 46.9 nm (Ne-like Ar line). At present a pinching plasma column of nitrogen-filled capillary discharge is also studied in our department for the development of XUV (soft X-ray) lasers, which are based on recombination pumping scheme. In this paper the recent results obtained from both these discharge systems (argon-, nitrogen-filled capillaries) will be presented.n
Czech name
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Czech description
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Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year
2016
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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