Overlap and rotate - a simple method for predicting out-of-plane and in-plane orientations of heteroepitaxial thin films
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61989100%3A27360%2F24%3A10254399" target="_blank" >RIV/61989100:27360/24:10254399 - isvavai.cz</a>
Alternative codes found
RIV/61989100:27640/24:10254399
Result on the web
<a href="https://www.sciencedirect.com/science/article/pii/S2468023024002888" target="_blank" >https://www.sciencedirect.com/science/article/pii/S2468023024002888</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.surfin.2024.104129" target="_blank" >10.1016/j.surfin.2024.104129</a>
Alternative languages
Result language
angličtina
Original language name
Overlap and rotate - a simple method for predicting out-of-plane and in-plane orientations of heteroepitaxial thin films
Original language description
The production of heteroepitaxial thin films is increasingly important due to their considerable utility in technical practice. This usability is determined by their specific physical and chemical properties influenced by the mutual crystallographic substrate-film orientation, both the out-of-plane and the in-plane. The possibility of predicting these orientations would reduce the time and financial burden of their experimental determination. This study shows how the out-of-plane and the in-plane orientation of heteroepitaxial film can be predicted by simply calculating number of overlapping atoms in a system of two overlapping crystallographic planes, one of which rotates relatively to the other. Coordinates of atoms in the crystallographic planes are taken from bulk structures, which contributes to the simplicity of the method. The average number of overlapping atoms (calculated from a 360o rotation) and the maximum number of overlapping atoms (including a corresponding angle) indicate the out-of-plane and the in-plane orientation, respectively. The method is tested on various substrate/film systems (SrTiO3/ZnO, Al2MgO4/ZnO, MgO/ZnO, MgO/CuO, Si/Al, MoS2/Au) and the results are compared with experimental data obtained from the literature. The good agreement with the experimental data shows this method to be reliable and sufficiently accurate for heteroepitaxial thin films.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
20506 - Coating and films
Result continuities
Project
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Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2024
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Surfaces and Interfaces
ISSN
2468-0230
e-ISSN
2468-0230
Volume of the periodical
46
Issue of the periodical within the volume
březen 2024
Country of publishing house
NL - THE KINGDOM OF THE NETHERLANDS
Number of pages
13
Pages from-to
1-13
UT code for WoS article
001224490300001
EID of the result in the Scopus database
2-s2.0-85187332192