Controlling the plasmonic properties of titanium nitride thin films by radiofrequency substrate biasing in magnetron sputtering
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61989100%3A27640%2F21%3A10248224" target="_blank" >RIV/61989100:27640/21:10248224 - isvavai.cz</a>
Alternative codes found
RIV/00216305:26620/21:PU141898 RIV/61989592:15640/21:73607589 RIV/61989592:15310/21:73607589
Result on the web
<a href="https://www.sciencedirect.com/science/article/pii/S016943322100619X?via%3Dihub" target="_blank" >https://www.sciencedirect.com/science/article/pii/S016943322100619X?via%3Dihub</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.apsusc.2021.149543" target="_blank" >10.1016/j.apsusc.2021.149543</a>
Alternative languages
Result language
angličtina
Original language name
Controlling the plasmonic properties of titanium nitride thin films by radiofrequency substrate biasing in magnetron sputtering
Original language description
Titanium nitride (TiN) is a promising plasmonic material alternative to gold and silver thanks to its refractory character, low resistivity (<100 mu Omega cm) and compatibility with microelectronic industry processes. Extensive research is currently focusing on the development of magnetron sputtering as a large-scale technique to produce TiN thin films with low resistivity and optimized plasmonic performance. As such, more knowledge on the correlation between process parameters and the functional properties of TiN is needed. Here we report the effect of radiofrequency (RF) substrate biasing during the sputtering process on the structural, optical and electrical properties of TiN films. We employ spectroscopic ellipsometry as a sensible characterization method and we show that a moderate RF power, despite reducing the grain size, allows to achieve optimal plasmonic quality factors and a low resistivity (<100 mu Omega cm). This is attributed to the introduction of a slight under-stoichiometry in the material (i.e., TiN0.85), as opposite to the films synthesized without bias or under intense bombardment conditions. RF substrate biasing during magnetron sputtering appears thus as a viable tool to prepare TiN thin films at room temperature with desired plasmonic properties.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10300 - Physical sciences
Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2021
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Applied Surface Science
ISSN
0169-4332
e-ISSN
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Volume of the periodical
554
Issue of the periodical within the volume
July
Country of publishing house
US - UNITED STATES
Number of pages
9
Pages from-to
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UT code for WoS article
000647733600004
EID of the result in the Scopus database
2-s2.0-85103101418