Quasistatic Equilibrium Chemical Vapor Deposition of Graphene
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61989100%3A27710%2F21%3A10248492" target="_blank" >RIV/61989100:27710/21:10248492 - isvavai.cz</a>
Result on the web
<a href="https://www.webofscience.com/wos/woscc/full-record/WOS:000720738600001" target="_blank" >https://www.webofscience.com/wos/woscc/full-record/WOS:000720738600001</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1002/admi.202101500" target="_blank" >10.1002/admi.202101500</a>
Alternative languages
Result language
angličtina
Original language name
Quasistatic Equilibrium Chemical Vapor Deposition of Graphene
Original language description
This study reviews the majorly used chemical vapor deposition (CVD) with a focus on confined reaction configurations in which quasistatic equilibrium conditions are obtained for the fabrication of graphene with large size and high quality through controlled nucleation density, feedstock flux, and growth rates. The confinement configurations can also be used to tune the thickness, domain size and shape, and stacking order of the synthetic graphene. The confined CVD reaction configurations discussed include enclosure systems, inner-tube setups, sandwiched substrates, as well as other types of configurations. The advantages and limitations of the different confinement configurations are presented, along ways to optimize the operational parameters for them.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
20400 - Chemical engineering
Result continuities
Project
<a href="/en/project/EF16_019%2F0000853" target="_blank" >EF16_019/0000853: Institute of Environmental Technology - Excellent Research</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2021
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Advanced Materials Interfaces
ISSN
2196-7350
e-ISSN
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Volume of the periodical
Neuveden.
Issue of the periodical within the volume
November
Country of publishing house
US - UNITED STATES
Number of pages
16
Pages from-to
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UT code for WoS article
000720738600001
EID of the result in the Scopus database
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