Effect of deposition conditions on mechanical properties of magnetron sputtered SiC thin films
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61989592%3A15310%2F12%3A33141402" target="_blank" >RIV/61989592:15310/12:33141402 - isvavai.cz</a>
Alternative codes found
RIV/49777513:23640/12:43917344
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Effect of deposition conditions on mechanical properties of magnetron sputtered SiC thin films
Original language description
The interdependence of mechanical properties (hardness, elastic modulus, internal stress, coefficient of friction), structure and composition of various amorphous and nanocrystalline DC magnetron and DC reactive magnetron sputtered SiC a SiC:H films wasstudied. Composition was determined by electron micro analyses and structure was investigated using Raman spectroscopy. Indentation hardness and reduced modulus were measured by instrumented nanoindentation, the coefficient of friction was evaluated using pin-on-disc method. It has been shoved that mechanical and tribological properties of a-SiC are strongly influenced by conditions of deposition process. Using appropriate deposition setup it is possible to obtain superhard nanocrystalline films with hardness of 40 GPa (higher than ?-SiC) as well as films compromising high hardness (approx. 19 GPa) and relatively low friction (approx. 0.15).
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BH - Optics, masers and lasers
OECD FORD branch
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Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2012
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Chemické listy
ISSN
0009-2770
e-ISSN
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Volume of the periodical
106
Issue of the periodical within the volume
SI3
Country of publishing house
CZ - CZECH REPUBLIC
Number of pages
4
Pages from-to
"s395"-"s398"
UT code for WoS article
000314237900010
EID of the result in the Scopus database
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