Atmospheric Pressure Chemical Vapour Deposition of Selenium Films by KrF Laser Photolysis of Dimethyl Selenium.

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F67985858%3A_____%2F01%3A27013070" target="_blank" >RIV/67985858:_____/01:27013070 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Atmospheric Pressure Chemical Vapour Deposition of Selenium Films by KrF Laser Photolysis of Dimethyl Selenium.

Original language description

Krf laser-induced photolysis of gaseous dimethyl selenium in excess of helium is controlled by cleavage of both Se-C bonds and affords ethane as a very dominant gaseous product together with elemental selenium. The photolysis mechanism being different from that of thermolysis shows potential for chemical vapour deposition of selenium films not contaminated with carbon impurities.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

CH - Nuclear and quantum chemistry, photo chemistry

OECD FORD branch

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Project

<a href="/en/project/ME%20191" target="_blank" >ME 191: Organic reaction control by using lasers</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2001

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Applied Surface Science

ISSN

0169-4332

e-ISSN

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Volume of the periodical

172

Issue of the periodical within the volume

3-4

Country of publishing house

NL - THE KINGDOM OF THE NETHERLANDS

Number of pages

4

Pages from-to

220-224

UT code for WoS article

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EID of the result in the Scopus database

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