Fabrication of Cu(x)Ge(y) Nanoplatelets

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F67985858%3A_____%2F11%3A00376022" target="_blank" >RIV/67985858:_____/11:00376022 - isvavai.cz</a>
Alternative codes found
RIV/68407700:21340/11:00192037 RIV/61388980:_____/11:00376022 RIV/49777513:23640/11:43898582
Result on the web
<a href="http://dx.doi.org/10.1166/jnn.2011.5080" target="_blank" >http://dx.doi.org/10.1166/jnn.2011.5080</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1166/jnn.2011.5080" target="_blank" >10.1166/jnn.2011.5080</a>

Result language
angličtina
Original language name
Fabrication of Cu(x)Ge(y) Nanoplatelets
Original language description
Modern technologies demand novel alloy materials for advanced devices and applications. Here we report on Low Pressure Chemical Vapor Deposition (LPCVD) of Ge(2)Me(6) and SnMe4 leading to deposition of nanoplatelets along with nanoparticles. According toanalytical techniques (Raman spectroscopy, ED, EDX, SEM and HRTEM) the nanoplatelets up to several tens of mu m in length have been prepared in two alloy modifications orthorhombic Cu(3)Ge and hexagonal Cu(86)Ge(14). Thickness of the nanoplatelets ranges from 50 to 150 nm. CuSn seeds served for the growth of Ge nanoparticles scattered among nanoplatelets.
Czech name
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Czech description
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Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
CF - Physical chemistry and theoretical chemistry
OECD FORD branch
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Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year
2011
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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