Nanoscale morphology tailoring in plasma deposited CN (x) layers

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F67985882%3A_____%2F23%3A00571728" target="_blank" >RIV/67985882:_____/23:00571728 - isvavai.cz</a>

Result on the web

<a href="http://dx.doi.org/10.1088/1361-6463/accc3f" target="_blank" >http://dx.doi.org/10.1088/1361-6463/accc3f</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1088/1361-6463/accc3f" target="_blank" >10.1088/1361-6463/accc3f</a>

Result language

angličtina

Original language name

Nanoscale morphology tailoring in plasma deposited CN (x) layers

Original language description

Magnetron discharge plasma was applied for the synthesis of CN (x) thin layers using methane and nitrogen gas precursors. The incorporation of nitrogen in the carbon network resulted in the dramatic evolution of growth morphology: from a 'buried' porous layer observed at low nitrogen incorporation to aligned bundles of nanorods grown perpendicular to the substrate surface at maximum discharge power and nitrogen flow. The films deposited at the low discharge power and high nitrogen incorporation exhibited a mesoporous sponge-like morphology after vacuum annealing. Relevant physical mechanisms responsible for the formation of nano- and mesoshaped morphology are discussed in terms of the effects of internal mechanical stresses and plasma etching. In addition, the sensing properties of the sponge-like layer were preliminarily examined in water vapor and ammonia ambients. The CN (x) films showed enhanced sensitivity to ammonia and reverse electrical response to moisture in comparison with a nitrogen-free nanoporous carbon film, which were assigned to modification of the electronic properties of the nitridated surface.

Czech name

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Czech description

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Type

J_imp - Article in a specialist periodical, which is included in the Web of Science database

CEP classification

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OECD FORD branch

20501 - Materials engineering

Project

—

Continuities

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year

2023

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Journal of Physics D-Applied Physics

ISSN

0022-3727

e-ISSN

1361-6463

Volume of the periodical

56

Issue of the periodical within the volume

27

Country of publishing house

US - UNITED STATES

Number of pages

13

Pages from-to

275302

UT code for WoS article

000976644400001

EID of the result in the Scopus database

2-s2.0-85154567469