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Treatment and Stability of Sodium Hyaluronate Films in Low Temperature Inductively Coupled Ammonia Plasma

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F70883521%3A28110%2F12%3A43867982" target="_blank" >RIV/70883521:28110/12:43867982 - isvavai.cz</a>

  • Alternative codes found

    RIV/70883521:28610/12:43867982

  • Result on the web

    <a href="http://dx.doi.org/10.1007/s11090-012-9387-7" target="_blank" >http://dx.doi.org/10.1007/s11090-012-9387-7</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1007/s11090-012-9387-7" target="_blank" >10.1007/s11090-012-9387-7</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Treatment and Stability of Sodium Hyaluronate Films in Low Temperature Inductively Coupled Ammonia Plasma

  • Original language description

    Surface of sodium hyaluronate films was modified in the inductively coupled low temperature ammonia plasma. The amount of bonded nitrogen was measured by the XPS method. The optical emission and temperature of the sample surface were measured during sample processing. Increased processing time and increased discharge power caused a rise of nitrogen concentration on the surface of hyaluronan films, though this effect is limited due to surface saturation and sample destruction at elevated discharge power.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

  • CEP classification

    CD - Macromolecular chemistry

  • OECD FORD branch

Result continuities

  • Project

    Result was created during the realization of more than one project. More information in the Projects tab.

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>S - Specificky vyzkum na vysokych skolach

Others

  • Publication year

    2012

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Plasma Chemistry and Plasma Processing

  • ISSN

    0272-4324

  • e-ISSN

  • Volume of the periodical

    32

  • Issue of the periodical within the volume

    5

  • Country of publishing house

    US - UNITED STATES

  • Number of pages

    17

  • Pages from-to

    1075-1091

  • UT code for WoS article

    000308191500011

  • EID of the result in the Scopus database