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Oxygen Precipitation in CZ Si Wafers after High Temperature

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68081723%3A_____%2F10%3A00421395" target="_blank" >RIV/68081723:_____/10:00421395 - isvavai.cz</a>

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    Oxygen Precipitation in CZ Si Wafers after High Temperature

  • Original language description

    In this work we study two stage and three stage annealing processes with application of Tabula rasa. The evolution of precipitates at various phases during annealing process for various temperatures was obtained from series of experimental techniques.

  • Czech name

  • Czech description

Classification

  • Type

    D - Article in proceedings

  • CEP classification

    BM - Solid-state physics and magnetism

  • OECD FORD branch

Result continuities

  • Project

  • Continuities

    I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Others

  • Publication year

    2010

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Article name in the collection

    SILICON 2010. 12th Scientific and Business Conference

  • ISBN

    978-80-254-7361-0

  • ISSN

  • e-ISSN

  • Number of pages

    2

  • Pages from-to

  • Publisher name

    TECON Scientific, s.r.o.

  • Place of publication

    Rožnov pod Radhoštěm

  • Event location

    Rožnov pod Radhoštěm

  • Event date

    Nov 2, 2010

  • Type of event by nationality

    EUR - Evropská akce

  • UT code for WoS article