Multiaxis interferometric system for positioning in nanometrology
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68081731%3A_____%2F10%3A00352186" target="_blank" >RIV/68081731:_____/10:00352186 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Multiaxis interferometric system for positioning in nanometrology
Original language description
We present a system for dimensional nanometrology based on scanning probe microscopy techniques (primarily atomic force microscopy, AFM) for detection of sample profile combined with interferometer controlled positioning. The interferometric setup not only improves resolution of the position control but also ensures direct traceability to the primary etalon of length. The system was developed to operate at and in cooperation with the Czech metrology institute for calibration purposes and nanometrology.The interferometers are supplied from a frequency doubled Nd:YAG laser stabilized by linear absorption spectroscopy in molecular iodine and the interferometric configuration controls the stage position in all six degrees of freedom.
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
BH - Optics, masers and lasers
OECD FORD branch
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Result continuities
Project
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Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2010
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
Proceedings of the 9th WSEAS International Conference on Microelectronics, Nanoelectronics, Optoelectronic
ISBN
978-954-92600-3-8
ISSN
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e-ISSN
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Number of pages
4
Pages from-to
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Publisher name
WSEAS EUROPMENT Press
Place of publication
Sofia
Event location
Catania
Event date
May 29, 2010
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
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