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Effect of sample tilt on PEEM resolution

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68081731%3A_____%2F12%3A00385323" target="_blank" >RIV/68081731:_____/12:00385323 - isvavai.cz</a>

  • Result on the web

    <a href="http://dx.doi.org/10.1016/j.ultramic.2011.11.011" target="_blank" >http://dx.doi.org/10.1016/j.ultramic.2011.11.011</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1016/j.ultramic.2011.11.011" target="_blank" >10.1016/j.ultramic.2011.11.011</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Effect of sample tilt on PEEM resolution

  • Original language description

    In electron microscopy design, the systems are usually assumed to be perfectly aligned or that possible small imperfections can be eliminated by simple multipole correctors (centering deflectors, stigmators) without loss of resolution. However, in some cases, like in the cathode lens between the sample and the objective lens in the photoemission electron microscope, even a small imperfection can impair the resolution significantly. Because of the strong field between the sample and the objective lens, even a small tilt of the sample generates a parasitic dipole field, which decreases resolution and causes image deformations. We present a simulation of the influence of a small sample tilt on the system resolution based on modern computational methods that enable simulation of the whole system including the parasitic fields, proper setting of centering deflectors and stigmators. The resolution is determined by simulating the point spread function and finding the size of its significant p

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

  • CEP classification

    BH - Optics, masers and lasers

  • OECD FORD branch

Result continuities

  • Project

    <a href="/en/project/IAA100650805" target="_blank" >IAA100650805: Misalignment aberrations in electron optical systems</a><br>

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Others

  • Publication year

    2012

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Ultramicroscopy

  • ISSN

    0304-3991

  • e-ISSN

  • Volume of the periodical

    119

  • Issue of the periodical within the volume

    S1

  • Country of publishing house

    NL - THE KINGDOM OF THE NETHERLANDS

  • Number of pages

    6

  • Pages from-to

    45-50

  • UT code for WoS article

    000308079200008

  • EID of the result in the Scopus database