Plasma cleaning effect on the stability of the Epon resin sections
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68081731%3A_____%2F16%3A00465340" target="_blank" >RIV/68081731:_____/16:00465340 - isvavai.cz</a>
Alternative codes found
RIV/60077344:_____/16:00465340
Result on the web
<a href="http://onlinelibrary.wiley.com/doi/10.1002/9783527808465.EMC2016.5995/pdf" target="_blank" >http://onlinelibrary.wiley.com/doi/10.1002/9783527808465.EMC2016.5995/pdf</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1002/9783527808465.EMC2016.5995" target="_blank" >10.1002/9783527808465.EMC2016.5995</a>
Alternative languages
Result language
angličtina
Original language name
Plasma cleaning effect on the stability of the Epon resin sections
Original language description
Low voltage TEM and STEM (transmission and scanning transmission electron microscope) can be regarded as the method of choice for many structural studies of very thin biological samples like ultrathin sections, viruses etc. Unfortunately, the specimen contamination increases with electron flux and therefore a specimen cleanliness is an important factor in obtaining of valuable data especially in STEM. An important parameter for imaging of those samples is a sensitivity of the sample to degradation by electron beam. The mass loss indicates a degree of the radiation damage. We investigated the mass loss of embedding medium (Epon resin of middle hardness) in combination of different thickness of the sections (60 nm and 150 nm) with using or not-using of plasma cleaning which is often used to removing of contamination from the sample.
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
JA - Electronics and optoelectronics
OECD FORD branch
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Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2016
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
EMC2016. The 16th European Microscopy Congress. Proceedings
ISBN
9783527808465
ISSN
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e-ISSN
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Number of pages
2
Pages from-to
597-598
Publisher name
Wiley
Place of publication
Oxford
Event location
Lyon
Event date
Aug 28, 2016
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
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