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Hiding e-beam exposure fields by deterministic 2D pattering

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68081731%3A_____%2F18%3A00494364" target="_blank" >RIV/68081731:_____/18:00494364 - isvavai.cz</a>

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    Hiding e-beam exposure fields by deterministic 2D pattering

  • Original language description

    The high stability and good current homogeneity in the spot of the e-beam writer is crucial tonthe exposure quality, particularly in the case of large-area structures when gray-scalenlithography is used. Even though the deflection field distortion is calibrated regularly andnbeam focus and beam astigmatism is dynamically corrected over the entire deflection field, we can observe disturbances in the exposed relief.nRecently, we presented a method that makes use of e–beam exposure imperfection bynintroducing marginally visible high–frequency diffraction gratings of variable pitch that fill innseparate orthogonal exposure fields. The actually presented approach follows up ournresearch on aperiodic arrangements of optical primitives, especially on the phyllotactic–nlike arrangement of sub–micron relief optical elements. This approach is extended from thendiffraction element arrangement to the higher level of exposure fields arrangements.

  • Czech name

  • Czech description

Classification

  • Type

    D - Article in proceedings

  • CEP classification

  • OECD FORD branch

    10306 - Optics (including laser optics and quantum optics)

Result continuities

  • Project

    Result was created during the realization of more than one project. More information in the Projects tab.

  • Continuities

    I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Others

  • Publication year

    2018

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Article name in the collection

    Recent Trends in Charged Particle Optics and Surface Physics Instrumentation. Proceedings of the 16th International Seminar

  • ISBN

    978-80-87441-23-7

  • ISSN

  • e-ISSN

  • Number of pages

    2

  • Pages from-to

    36-37

  • Publisher name

    Institute of Scientific Instruments The Czech Academy of Sciences

  • Place of publication

    Brno

  • Event location

    Skalský dvůr

  • Event date

    Jun 4, 2018

  • Type of event by nationality

    WRD - Celosvětová akce

  • UT code for WoS article

    000450591400012