Photolitography on flexible substrates

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68081731%3A_____%2F18%3A00500532" target="_blank" >RIV/68081731:_____/18:00500532 - isvavai.cz</a>
Alternative codes found
RIV/70883521:28610/17:63516463
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Photolitography on flexible substrates
Original language description
Nowadays preparation of structures on flexible substrates is highly demanded because of using this patterns in field of flexible electronics. This contribution deals with photolitographic procces for preparation of structures on flexible substrates. The method of photolitography enables to create designed patterns in various material (e.g. metals as conductive layers) on various substrates (silicon wafers, foils, etc.). First the designed pattern is exposed through the mask by UV light into polymer resist, then the pattern is transfered into metal layer by wet etching through the developed windows in resist. In this paper several patterns are prepared through the positive resist PMMA by photolitography into various metal layer (Cu, Al) on flexible substrates.
Czech name
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Czech description
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Project
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Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year
2018
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
9th International conference on nanomaterrials - research & application (NANOCON 2017). Proceedings
ISBN
978-80-87294-81-9
ISSN
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e-ISSN
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Number of pages
4
Pages from-to
914-917
Publisher name
TANGER
Place of publication
Ostrava
Event location
Brno
Event date
Oct 18, 2017
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
000452823300152

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