Photolitography on flexible substrates

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F70883521%3A28610%2F17%3A63516463" target="_blank" >RIV/70883521:28610/17:63516463 - isvavai.cz</a>
Alternative codes found
RIV/68081731:_____/18:00500532
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Photolitography on flexible substrates
Original language description
Nowadays preparation of structures on flexible substrates is highly demanded because of using this patterns in field of flexible electronics. This contribution deals with photolitographic procces for preparation of structures on flexible substrates. The method of photolitography enables to create designed patterns in various material (e.g. metals as conductive layers) on various substrates (silicon wafers, foils, etc.). First the designed pattern is exposed through the mask by UV light into polymer resist, then the pattern is transfered into metal layer by wet etching through the developed windows in resist. In this paper several patterns are prepared through the positive resist PMMA by photolitography into various metal layer (Cu, Al) on flexible substrates.
Czech name
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Czech description
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Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2017
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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