Automated System for Optical Inspection of Defects in Resist-coated Non-patterned Wafer

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68081731%3A_____%2F20%3A00532029" target="_blank" >RIV/68081731:_____/20:00532029 - isvavai.cz</a>
Result on the web
<a href="http://journals.yu.edu.jo/jjp/JJPIssues/Vol13No2pdf2020/1.html" target="_blank" >http://journals.yu.edu.jo/jjp/JJPIssues/Vol13No2pdf2020/1.html</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.47011/13.2.1" target="_blank" >10.47011/13.2.1</a>

Result language
angličtina
Original language name
Automated System for Optical Inspection of Defects in Resist-coated Non-patterned Wafer
Original language description
Quality control of the resist coating on a silicon wafer is one of the major tasks prior to the exposition of patterns into the resist layer. Thus, the ability to inspect and identify the physical defect in the resist layer plays an important role. The absence of any unwanted defect in resist is an ultimate requirement for preparation of precise and functional micro- or nano-patterned surfaces. Currently used wafer inspection systems are mostly utilized in semiconductor or microelectronic industry to inspect non-patterned or patterned wafers (integrated circuits, photomasks,. etc.) in order to achieve high yield production. Typically, they are based on acoustic micro-imaging, optical imaging or electron microscopy. This paper presents the design of a custom optical-based inspection device for small batch lithography production that allows scanning a wafer surface with an optical camera and by analyzing the captured images to determine the coordinates (X, Y), the size and the type of the defects in the resist layer. In addition, software responsible for driving the scanning device and for advanced image processing is presented.
Czech name
—
Czech description
—

Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
—
OECD FORD branch
20205 - Automation and control systems

Project
<a href="/en/project/FV10618" target="_blank" >FV10618: Micro and Nano Optics for Controled Light Directing from LED Sources</a><br>
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year
2020
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Similar results(10)