Design of Setup for Laser Induced Plasma Etching
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68081731%3A_____%2F24%3A00617414" target="_blank" >RIV/68081731:_____/24:00617414 - isvavai.cz</a>
Result on the web
<a href="https://ieeexplore.ieee.org/document/10652276" target="_blank" >https://ieeexplore.ieee.org/document/10652276</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1109/IVNC63480.2024.10652276" target="_blank" >10.1109/IVNC63480.2024.10652276</a>
Alternative languages
Result language
angličtina
Original language name
Design of Setup for Laser Induced Plasma Etching
Original language description
Plasma etching introduces a physically activated chemical process highly utilized in the semiconductor industry. However, for the creation of etched structures mask has to be prepared on top of the etched surfaces. This is usually achieved by electron beam lithography, which adds to the complexity and financial demands of the overall process. We present the design of a setup for maskless plasma etching, which utilizes a tightly focused ultrashort laser pulse for the ignition of etching plasma in a custom vacuum chamber with a connection to a gas-containing etching species. In addition, etched structures are written into the surface of sample by scanning with the vacuum chamber with relation to fixed laser focus. This enables maskless 3D etching of samples with a less complicated technological process.
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
—
OECD FORD branch
10306 - Optics (including laser optics and quantum optics)
Result continuities
Project
<a href="/en/project/TN02000020" target="_blank" >TN02000020: Centre of Advanced Electron and Photonic Optics</a><br>
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2024
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
2024 37th International Vacuum Nanoelectronics Conference, IVNC 2024
ISBN
979-8-3503-7977-8
ISSN
2164-2370
e-ISSN
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Number of pages
2
Pages from-to
44-45
Publisher name
IEEE
Place of publication
New York
Event location
Brno
Event date
Jul 15, 2024
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
001310530600005