Tantalum ions produced by 1064 nm pulsed laser irradiation.

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F02%3A02020271" target="_blank" >RIV/68378271:_____/02:02020271 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Tantalum ions produced by 1064 nm pulsed laser irradiation.

Original language description

A Q-switched Nd:YAG laser (1064 nm wavelength) with a 9 ns pulse width 1-900 mJ pulse energy, and 0.5 mm 2 target spot, is employed to irradiate tantalum targets in vacuum.The irradiation produces a strong etching of the metal and forms a plasma in frontof the target.The plasma contains neutrals and ions with a high charge state and wide energy distribution.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BH - Optics, masers and lasers

OECD FORD branch

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Project

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Continuities

Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2002

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Journal of Applied Physics

ISSN

0021-8979

e-ISSN

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Volume of the periodical

91

Issue of the periodical within the volume

N/A

Country of publishing house

US - UNITED STATES

Number of pages

8

Pages from-to

4685-4692

UT code for WoS article

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EID of the result in the Scopus database

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