KrF laser deposition combined with magnetron sputtering to grow titanium-carbide layers

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F06%3A00039940" target="_blank" >RIV/68378271:_____/06:00039940 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
KrF laser deposition combined with magnetron sputtering to grow titanium-carbide layers
Original language description
Titanium carbide films were grown using a magnetron assisted pulse laser deposition combining KrF pulsed laser deposition and DC magnetron sputtering (PLDMS). Plasma streams produced by magnetron and laser ablation were intersected on the substrate surface. Films properties were characterized by GDOES, AFM, XRD, XPS as well as by Raman spectroscopy. The adhesiojn and microhardness were also studied. Crystalline TiC films were fabricated at room temperature
Czech name
KrF laserová depozice kombinovaná s magnetronem pro růst TiC vrystev
Czech description
TiC crystvy byly vytvářeny kombinací magnetronového napařování a laserové deposice. Vlastnosti vrystev byly charakterizovány metodami GDOES, AFM, XRD, XPS a Ramanovskou spektroskopii. Byla studována adheze a mikrotvrdost. Vrstvy TiC byly připraveny za pokojové teploty podložky

Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
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Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year
2006
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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