SiCx layers prepared by hybrid laser deposition and PLD
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F09%3A00335778" target="_blank" >RIV/68378271:_____/09:00335778 - isvavai.cz</a>
Alternative codes found
RIV/68407700:21460/09:00166868
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
SiCx layers prepared by hybrid laser deposition and PLD
Original language description
Thin SiCx films were fabricated using hybrid laser-magnetron deposition system and pulsed laser deposition (PLD). Film topology, crystallinity, composition and chemical bonds were studied.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
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Result continuities
Project
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Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2009
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Plasma Processes and Polymers
ISSN
1612-8850
e-ISSN
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Volume of the periodical
6
Issue of the periodical within the volume
S1
Country of publishing house
DE - GERMANY
Number of pages
4
Pages from-to
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UT code for WoS article
000272302900074
EID of the result in the Scopus database
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